Heavy-Duty Spin Coater for Laboratory Use, Suitable for Perovskite Thin Films and Silicon Wafers, with High-Speed Rotation up to 10,000 RPM, Ideal for Upgraded School Laboratories.

Heavy-Duty Spin Coater for Laboratory Use, Suitable for Perovskite Thin Films and Silicon Wafers, with High-Speed Rotation up to 10,000 RPM, Ideal for Upgraded School Laboratories.

WEVIO Heavy-Duty Spin Coater

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Heavy-Duty Spin Coater for Laboratory Use, Suitable for Perovskite Thin Films and Silicon Wafers, with High-Speed Rotation up to 10,000 RPM, Ideal for Upgraded School Laboratories.

Product Name: 12AC-700 Spin Coater

Wafer/Workpiece Size: 300 mm square (subject to discussion and confirmation)

Time per Stage: 3,000 seconds per stage; resolution: 0.1 seconds

Power Supply: 220 V, 3-pin plug

Total Power Consumption: 1 kW

Touchscreen Size: 4.3 inches / 7 inches

Program Stages: 1–5 stages (up to 30 stages)

Program Groups: 12 groups (up to 48 groups)

Rotational Speed Range: 100–3,000 RPM (up to 10,000 RPM)

Speed Resolution: 1 RPM

Acceleration: 100–1,000 RPM/s under no-load conditions (up to 5,000 RPM/s)

Dimensions: 800 × 800 × 770 mm

Weight: 70 kg

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