16EZ-NFS Corrosion-Resistant Compact Spin Coater for Perovskite Applications, Laboratory and Educational Use, High-Speed Silicon Wafer Coating

Application Scope

This Spin Coater equipment is widely used for coating substrates in various fields, including micro-electromechanical systems (MEMS) micromachining, biotechnology, materials science, semiconductors, photomask fabrication, new energy, thin films, optics, and surface coating. It is particularly suitable for coating small substrates or samples that are too small for conventional dip-coating or blade-coating methods.

Working Principle and Applications

The equipment operates by rotating a vacuum chuck at a specified speed for a specified duration, allowing colloidal materials and other coating solutions dispensed onto the substrate to spread uniformly across its surface under centrifugal force. It is primarily used in processes such as photoresist coating, boron coating, and other thin-film deposition applications.